Workshop on FPD Manufacturing, Materials and Components


IDW TOP 18 HOME Timetable

Workshop on FPD Manufacturing, Materials and Components

date time session room

Wed., Dec. 12 13:20-14:40 FMC1 MicroLED Display Room 131

15:05-16:25 PRJ1/FMC2 Waveguide for AR-Near Eye Display
Special Topics of Interest on AR/VR and Hyper Reality

16:40-18:00 FMC3 Display Optics

Thu., Dec. 13 9:00-10:35 LCT4/FMC4 New Materials and Components for LCDs Reception Hall 2

14:20-16:50 FMCp1 Display Optics (1)
Special Topics of Interest on AR/VR and Hyper Reality Event Hall

14:20-16:50 FMCp2 Display Optics (2)

14:20-16:50 FMCp3 FPD Manufacturing Technologies

14:20-16:50 FMCp4 FPD Materials and Components

14:20-16:50 FMCp5 WCG Color Filter
Special Topics of Interest on Wide Color Gamut and Color Reproduction

14:20-16:50 FMCp6 Quantum Dot Technologies in FPD Components
Special Topics of Interest on Quantum Dot Technologies

14:20-16:50 FMCp7 Manufacturing and Materials of Oxide TFTs
Special Topics of Interest on Oxide-Semiconductor TFT

17:10-18:30 FMC5 Manufacturing Room 131

Fri., Dec. 14 9:00-10:20 FMC6 Light Polarizing Technologies

10:40-12:00 FLX5/FMC7 Advanced Materials and Components for Flexible Electronics Reception Hall 2

13:10-14:30 FMC8 Advanced Materials Room 131

FMC1 : MicroLED Display

Wed., Dec. 12  13:20-14:40  Room 131

Chair: H. Fujioka (Univ. of Tokyo, Japan)
Co-Chair: K. Käläntär (Global Optics Solutions, Japan)

FMC1-1 Invited Feasibility of Nitride Micro-LEDs Prepared by Sputtering
H. Fujioka*'**, K. Ueno*, A. Kobayashi* (*Univ. of Tokyo, Japan, **JST ACCEL, Japan)

FMC1-2 Invited Wavelength-Stable and Narrow-Band Red LED for Monolithic Micro-LED Display
Y. Fujiwara, T. Inaba, K. Shiomi, S. Ichikawa, J. Tatebayashi (Osaka Univ., Japan)

FMC1-3 Invited Smart Micro-LED Display with Synchronized Information Broadcast for Enhanced User Interaction
X. Li*'**, B. Hussain*'**, J. Kang*'**, H. S.Kwok**, C. P. Yue*'** (*HKUST Shenzhen Res. Inst., China, **Hong Kong Univ. of S&T, Hong Kong)

FMC1-4 Status and Prospects of Micro LED Displays Advancements
E. Virey, Z. Bouhamri, P. Mukish (Yole Développement, France)

go to page top

PRJ1/FMC2 : Waveguide for AR-Near Eye Display
Special Topics of Interest on AR/VR and Hyper Reality

Wed., Dec. 12  15:05-16:25  Room 131

Chair: D. Cuypers (CMST, Belgium)
Co-Chair: K. Käläntär (Global Optical Solutions, Japan)

PRJ1/FMC2-1 Invited A Plastic Holographic Waveguide Combiner for Light-Weight and Highly-Transparent Augmented Reality Glasses
T. Yoshida, K. Tokuyama, Y. Takai, D. Tsukuda, T. Kaneko, N. Suzuki, T. Anzai*, A. Yoshikaie, K. Akutsu, A. Machida (Sony, Japan, *Sony Global Manufacturing & Operations, Japan)

PRJ1/FMC2-2 Waveguide-HOE-Based Camera That Captures a Frontal Image for Flat-Panel Display
H. Konno*, S. Igarashi*, T. Nakamura*'**, M. Yamaguchi* (*Tokyo Tech, Japan, **JST PRESTO, Japan)

PRJ1/FMC2-3 Novel Holographic Waveguide Display with Kepler Telescope Configuration
Z. Shen, Y. Zhang, A. Liu, Y. Weng, X. Zhu, X. Li (Southeast Univ., China)

PRJ1/FMC2-4 Light Efficiency Modeling for a Holographic Waveguide Display
X. Zhu, Y. Zhang, Z. Shen, A. Liu, Y. Weng (Southeast Univ., China)

go to page top

FMC3 : Display Optics

Wed., Dec. 12  16:40-18:00  Room 131

Chair: S. Suyama (Tokushima Univ., Japan)
Co-Chair: H. Yamamoto (Utsunomiya Univ., Japan)

FMC3-1 See-Through Aerial Secure Display with Head-Tracking Function
S. Ito*, K. Uchida*, H. Yamamoto*'** (*Utsunomiya Univ., Japan, **JST ACCEL, Japan)

FMC3-2 Functional Projection Screen Using Diverted Corner Cube Retroreflector (D-CCR)
T. Uchida*'**, R. Ohtera*, K. Wako*, Y. Ishitaka**, M. Kano**, K. Käläntär *** (*Nat. Inst. of Tech. Sendai College, Japan, **Tohoku Univ., Japan, ***Global Optical Solutions, Japan)

FMC3-3 Curved Aerial Information Display by Use of a Half-Mirror-Coated Fresnel Lens
K. Shimose, M. Yasugi, T. Iwane*, M. Nakajima*, H. Yamamoto (Utsunomiya Univ., Japan, *Nikon, Japan)

FMC3-4 Optical Characteristics and Metrology of Flexible Light Sources (FLS)
K. Käläntär*'**, S. Maeda* (*CEREBA AIST, Japan, **Global Optical Solutions, Japan)

go to page top

LCT4/FMC4 : New Materials and Components for LCDs

Thu., Dec. 13  9:00-10:35  Reception Hall 2

Chair: S. Oka (Japan Display, Japan)
Co-Chair: R. Yamaguchi (Akita Univ., Japan)

LCT4/FMC4-1 Invited The Application of Quantum Dot in TV Display Technology
N. Chen, H. Ji, H. Xu, Z. Li, L. Liang (TCL Elect. Holdings, China)

LCT4/FMC4-2 Invited Cholesteric Liquid Crystals As Solution-Processable Holographic Optical Elements
H. Yoshida*'**, S. Cho*, M. Ono*, Y. Tsuboi*, Z. Fan*, M. Ozaki* (*Osaka Univ., Japan, **JST PRESTO, Japan)

LCT4/FMC4-3 Novel Black Photo Spacer Structure Applied in Liquid Crystal Display Technology
W. Cao, M. Liu, Z. Deng, Y. Lin, C. Chiu, L.Ray (Shenzhen China Star Optoelect. Tech., China)

LCT4/FMC4-4 New Reflective Polarizer Film for Automotive e-Mirror Application
H. Matsuda, K. Toyooka, M. Kugue* (3M Japan Prods., Japan, *3M Japan, Japan)

LCT4/FMC4-5L New Architecture of QD-on-Chip Encapsulation System
M. Uchida, K. Yoshida, H. Minamisawa, T. Masukawa, A. Miyanaga*, A. Moriyasu*, H. Nishikawa*, K. Iida*, M. Saeki*, J. Kaneno* (JNC Petrochem., Japan, *NS Materials, Japan)

go to page top

FMC5 : Manufacturing

Thu., Dec. 13  17:10-18:30  Room 131

Chair: T. Nonaka (Merck PM, Japan)
Co-Chair: Y. Inoue (Corning Japan, Japan)

FMC5-1 The Effect of Flash Lamp Annealing on the Performance of MOTFTs
M. Junghaehnel, T. Preussner, J. Westphalen (Fraunhofer Inst. for Organic Elect., Germany)

FMC5-2 Novel High Resolution Photolithography Process (Resolution Enhancement Technology)
H. Ikeda, T. Suzuki, Y. Toyama, T. Nonaka (Merck PM, Japan)

FMC5-3 Copper Undercut Mechanism Due to Side-Etch of Dry Process in Four-Mask Fabrication for High Resolution TFT-LCDs
M. Chen, L. Guo, C.-Y. Chiou, Z.-W. Tan, S. Sun, H. Xia, F. Long, W.-G. Liu, J.-X. Li (Shenzhen China Star Optoelect. Tech., China)

FMC5-4 Mass-Production-Feasible Three-Mask Technology for HVA-LCD TV
M.-X. Zhu, H.-Y. Xu, Z.-X. Jiang, T. Ou, S.-J. Chen, C.-Y. Lee, H. C. Lin (China Star Optoelect. Tech., China)

go to page top

FMC6 : Light Polarizing Technologies

Fri., Dec. 14  9:00-10:20  Room 131

Chair: I. Amimori (A51Tech, Japan)
Co-Chair: S. Namekawa (Nippon Steel & Sumikin Chem., Japan)

FMC6-1 Invited Design, Synthesis and Optical Properties of Chiral Polymers Emitting Efficient Circularly Polarized Light as OLED Materials
T. Nakano (Hokkaido Univ., Japan)

FMC6-2 Invited Chiral Intertwined Spirals and Chiroptical Properties Dictated by Cylinder Helicity: The Most Intense Circularly Polarized Luminescence in Organic Compounds
S. Sato*'** (*Univ. of Tokyo, Japan, **JST, Japan)

FMC6-3 Influence of Packaging Materials to Nano-Wire Grating Polarization Characteristics
H. Jun (Shenzhen China Star Optoelect. Semiconductor Display Tech., China)

FMC6-4 Proposal of Novel Random Polarization Film with Birefringent Crystals for Real-Color Displays
M. Udono*'**, Y. Koike*'** (*Keio Univ., Japan, **Keio Photonics Res. Inst., Japan)

go to page top

FLX5/FMC7 : Advanced Materials and Components for Flexible Electronics

Fri., Dec. 14  10:40-12:00  Reception Hall 2

Chair: T. Furukawa (Yamagata Univ., Japan)
Co-Chair: A. Fujita (JNC, Japan)

FLX5/FMC7-1 Thin and High-Quality ITO/Ag Alloy/ITO Structure for Display Electrodes
Y. Toshimori, S. Nonaka, T. Nagase (Mitsubishi Materials, Japan)

FLX5/FMC7-2 Improvement of Mura and CD by Adjusting Black Matrix Component in G8.6 TFT-LCD Color Filter
R. Wang, D. Zhang, D. Lei, X. Wang, J. Hung, J. Hsu, W. Chen, Y. Lu (Chongqing HKC Optoelect. Tech., China)

FLX5/FMC7-3 Black Photoresist Achieving Patterns with Extremely Low Reflection and Smooth Line Edge on Flexible Substrate
A. Igawa, M.-A. Hsu* (eChem Solutions Japan, Japan, *Consistent Elect. Materials, Taiwan)

FLX5/FMC7-4 The Effects of Surfactants and Dielectrophoresis on the Electrical Property of Single-Wall Carbon Nanotube Films
C. Wei, Z.-L. Yan (Tatung Univ., Taiwan)

go to page top

FMC8 : Advanced Materials

Fri., Dec. 14  13:10-14:30  Room 131

Chair: T. Tomono (Toppan Printing, Japan)
Co-Chair: M. Arai (ULVAC, Japan)

FMC8-1 Thin Cycloolefin Polymer Film with Low Ultraviolet Transmittance
Y. Hata, K. Inoue, N. Murata, H. Nakahori, S. Yamada (Zeon, Japan)

FMC8-2 High-Transmittance and Photopatternable High-k Insulating Film
C.-Y. Tung, S.-C. Lee, T.-H. Liao, W.-S. Yu, M.-W. Shen, W.-C. Tsai (AU Optronics, Taiwan)

FMC8-3 A Study and Estimate Method about Mo and MoTi Barrier Endurance for Cu Diffusion
X. Hu, L. Zhan, Y. Yin, J. Li, Y. Zhai, W. Cao, W. Huang, H. Yu,J. Zhang, S. Sun, W. Zhang (Shenzhen China Star Optoelect. Tech., China)

FMC8-4 The Research Focusing on Form Mechanism and Ameliorated Methods of Aluminum Thorn Grown on Gate Electrode Constructed Al/Mo Bi-layer
J. Wang, Y. Yin, J. Li, X. Wei, L. Cai, Q. Lin, J. Liu, C. Hu, S. Sun, W. Zhang (Shenzhen China Star Optoelect. Tech., China)

go to page top

Poster FMCp1 : Display Optics (1)
Special Topics of Interest on AR/VR and Hyper Reality

Thu., Dec. 13  14:20-16:50  Event Hall

FMCp1-1 LED Authentication Using a Smartphone for Volume Holograms
T. Yasuda, Y. Yoshimura, T. Yamauchi (Dai Nippon Printing, Japan)

go to page top

Poster FMCp2 : Display Optics (2)

Thu., Dec. 13  14:20-16:50  Event Hall

FMCp2-1 Fundamental Solutions of Interlaced Microstructures for Photo-Electric Device and the Pseudo Negative Refractive Index Modeling for Display Component
C.-J. Ou, J.-F. Qian, K.-Y. Chen, Z.-W. Wang, F.-R. Lin (Hsiuping Univ. of S&T, Taiwan)

FMCp2-2 Withdrawn

FMCp2-3 The Process and Reliability of Mini-LED Displays
I.-H. Hsieh, C.-H. Kuo, Y.-W. Chang, H.-H. Wu, K.-Y. Lee, H.-P. Kuo, Y.-H. Chang, T.-L. Niu, C. Fuh, C.-M. Yang, M.-T. Ho, Y.-T. Lee, Y.-W. Chen (AU Optronics, Taiwan)

FMCp2-4L Measurement of Optical Power Recovered by Planar Fluorescent Waveguides for Single-Spot Excitation
I. Fujieda, M. Ohta, M. Okuyama, Y. Tsutsumi (Ritsumeikan Univ., Japan)

FMCp2-5L Spatial Luminance Uniformity Improvement of Flexible Backlight Using Notch-Type Variable Light Distribution Film
T. Shoji, Y. Shibata, T. Ishinabe, H. Fujikake (Tohoku Univ., Japan)

FMCp2-6L Flexible Marble-Chain Letter-Strings Display System by Adjusting Intervals of Letters and All Dots
H. Mori, Y. Aoki, K. Sakamoto (Konan Univ., Japan)

go to page top

Poster FMCp3 : FPD Manufacturing Technologies

Thu., Dec. 13  14:20-16:50  Event Hall

FMCp3-1 Exposure Test Results of Organic Insulation Films with DUV Broadband Illumination for High Resolution Panels
K. Takasaki, N. Izumi, M. Hakko, M. Ando, N. Yabu, K. Nagano (Canon, Japan)

FMCp3-2 Study on One Infrequent Influencing Factor of TFT Mask
M. Wang, J. Liu, F. Li, Y. Jia, X. Ding, W. Chen (Beijing BOE Display Tech., China)

FMCp3-3 Acceptor Doping of ZnO Films by NO Gas Decomposition on a Heated Ir Wire Surface in a Catalytic Reaction-Assisted CVD
Y. Adachi, R. Iba, A. M. Hashim*, A. Kato, K. Yasui (Nagaoka Univ. of Tech., Japan, *Univ. Tech. Malaysia, Malaysia)

FMCp3-4 A Study and Improvement about Corrosion Mechanism of Mo/Cu Bilayer in Cleaning Process
Y. Yin, J. Li, X. Hu, L. Cai, X. Wei, Q. Lin, J. Wang, J. Liu, C. Hu, S. Sun, W. Zhang (Shenzhen China Star Optoelect. Tech., China)

FMCp3-5 A Study and Improvement about Corrosion Mechanism of Mo/Cu Bilayer in CVD
Y. Yin, J. Wang, X. Hu, J. Li, L. Cai, X. Wei, Q. Lin, J. Liu, C. Hu, S. Sun, W. Zhang (Shenzhen China Star Optoelect. Tech., China)

FMCp3-6 Four-Mask Process Architecture Using NH₃ Plasma Treatment Technology for Image Sticking Improvement in 32-in. TV Product
F.-Y. Yang, A.-T. Cho, J. Hsu, Z. Liu, K.-J. Liu, W. Chen, Y. Lu (Chongqing HKC Optoelect. Tech., China)

FMCp3-7 Optimization Design of Silicone PAD for Bended Window Lamination in the OLED Display
D.-H. Jang, B.-M. Park, S.-W. Lim, K.-Y. Han (Dankook Univ., Korea)

FMCp3-8L Reduction of Residual OH Content in a Low-Temperature Si Oxide Film at Less than 200°C
S. Horita (JAIST, Japan)

FMCp3-9L Study on Wet Etching Behavior of Amorphous CuZr Thin Film in Hydrogen Peroxide Solution for Stretchable Display
J.-W. Bae, M.-J. Kim, J. H. Seo (Korea Aerospace Univ., Korea)

go to page top

Poster FMCp4 : FPD Materials and Components

Thu., Dec. 13  14:20-16:50  Event Hall

FMCp4-1 Withdrawn

FMCp4-2 A Novel Liquid Crystal Displays Using Dye-Type In-Cell Polarizer
Z.-X. Chen, L.-X. Chen, H.-H. Chen (Shenzhen China Star Optoelect. Tech., China)

FMCp4-3 Withdrawn

FMCp4-4 Reduction of Charge Trapping in High-k HfZrO₄ Gate Insulators
A. R. Park, B. D. Choi (Sungkyunkwan Univ., Korea)

FMCp4-5L Morphological and Electrochemical Properties of Nickel Oxide Prepared by Wet-Chemical Method
K. H. Kim, S. Motoyama, Y. Abe, M. Kawamura, T. Kiba (Kitami Inst. of Tech., Japan)

FMCp4-6L Improvement in Optical Performance of GH-Type Polarizer Using Polarization Converting Film
S. Nonomura, Y. Iimura (Tokyo Univ. of A&T, Japan)

FMCp4-7L Study on LCST-Type Phase Behavior in Ionic Liquid Device with Blend Polyimide
Y. Izumi, K. Goda (Sanyo-onoda City Univ., Japan)

FMCp4-8L Effect of Surface Treatment by Atmospheric-Pressure Plasma on Optical Property for Ionic Liquid Device
K. Matsubara, N. Oshima, K. Goda (Sanyo-Onoda City Univ., Japan)

go to page top

Poster FMCp5 : WCG Color Filter
Special Topics of Interest on Wide Color Gamut and Color Reproduction

Thu., Dec. 13  14:20-16:50  Event Hall

FMCp5-1 Wide Gamut Display Using Red Color Filter-Technical Developments and Actual Products
D. M. Lee, S.-J. Yang, J.-Y. Lee, Y.-W. Kim, H.-J. Kim (LG Chem., Korea)

go to page top

Poster FMCp6 : Quantum Dot Technologies in FPD Components
Special Topics of Interest on Quantum Dot Technologies

Thu., Dec. 13  14:20-16:50

FMCp6-1L Stability Improvement of Quantum Dot Color Conversion Films by Direct Bonding Between Designed Ligands and Polymer Matrix
E. Nam, C. Lee, H. K. Chung, H. Chae (Sungkyunkwan Univ., Korea)

go to page top

Poster FMCp7 : Manufacturing and Materials of Oxide TFTs
Special Topics of Interest on Oxide-Semiconductor TFT

Thu., Dec. 13  14:20-16:50

FMCp7-1L Deposition of Insulator Film by Inductively Coupled Plasma CVD System with Low Impedance Antennas
T. Sakai, M. Fujiwara, D. Azuma, S. Nakata, Y. Setoguchi, Y. Andoh (Nissin Elec., Japan)

FMCp7-2L Deposition of Crystalline InGaZnO Film at Low Temperature Process by Inductively Coupled Plasma Sputtering System
D. Matsuo, R. Miyanaga*, T. Ikeda, S. Kisida, Y. Setoguchi, Y. Andoh, M. Fujii*, Y. Uraoka* (Nissin Elec., Japan, *NAIST, Japan)

FMCp7-3L ZnO:Ga Thin Film with Hydrogen and Nitrogen Post Annealing and Applications in Transparent RRAM
L. W. Wang, C.-C Lin, S.-Y. Chu (Nat. Cheng Kung Univ., Taiwan)

go to page top

date	time	session		room
Wed., Dec. 12	13:20-14:40	FMC1	MicroLED Display	Room 131
	15:05-16:25	PRJ1/FMC2	Waveguide for AR-Near Eye Display Special Topics of Interest on AR/VR and Hyper Reality
	16:40-18:00	FMC3	Display Optics
Thu., Dec. 13	9:00-10:35	LCT4/FMC4	New Materials and Components for LCDs	Reception Hall 2
	14:20-16:50	FMCp1	Display Optics (1) Special Topics of Interest on AR/VR and Hyper Reality	Event Hall
	14:20-16:50	FMCp2	Display Optics (2)
	14:20-16:50	FMCp3	FPD Manufacturing Technologies
	14:20-16:50	FMCp4	FPD Materials and Components
	14:20-16:50	FMCp5	WCG Color Filter Special Topics of Interest on Wide Color Gamut and Color Reproduction
	14:20-16:50	FMCp6	Quantum Dot Technologies in FPD Components Special Topics of Interest on Quantum Dot Technologies
	14:20-16:50	FMCp7	Manufacturing and Materials of Oxide TFTs Special Topics of Interest on Oxide-Semiconductor TFT
	17:10-18:30	FMC5	Manufacturing	Room 131
Fri., Dec. 14	9:00-10:20	FMC6	Light Polarizing Technologies	Room 131
	10:40-12:00	FLX5/FMC7	Advanced Materials and Components for Flexible Electronics	Reception Hall 2
	13:10-14:30	FMC8	Advanced Materials	Room 131

FMC1-1	Invited Feasibility of Nitride Micro-LEDs Prepared by Sputtering H. Fujioka', K. Ueno, A. Kobayashi* (Univ. of Tokyo, Japan, *JST ACCEL, Japan)
FMC1-2	Invited Wavelength-Stable and Narrow-Band Red LED for Monolithic Micro-LED Display Y. Fujiwara, T. Inaba, K. Shiomi, S. Ichikawa, J. Tatebayashi (Osaka Univ., Japan)
FMC1-3	Invited Smart Micro-LED Display with Synchronized Information Broadcast for Enhanced User Interaction X. Li', B. Hussain'*, J. Kang', H. S.Kwok, C. P. Yue'* (HKUST Shenzhen Res. Inst., China, *Hong Kong Univ. of S&T, Hong Kong)
FMC1-4	Status and Prospects of Micro LED Displays Advancements E. Virey, Z. Bouhamri, P. Mukish (Yole Développement, France)

PRJ1/FMC2-1	Invited A Plastic Holographic Waveguide Combiner for Light-Weight and Highly-Transparent Augmented Reality Glasses T. Yoshida, K. Tokuyama, Y. Takai, D. Tsukuda, T. Kaneko, N. Suzuki, T. Anzai, A. Yoshikaie, K. Akutsu, A. Machida (Sony, Japan, Sony Global Manufacturing & Operations, Japan)
PRJ1/FMC2-2	Waveguide-HOE-Based Camera That Captures a Frontal Image for Flat-Panel Display H. Konno, S. Igarashi, T. Nakamura', M. Yamaguchi (Tokyo Tech, Japan, *JST PRESTO, Japan)
PRJ1/FMC2-3	Novel Holographic Waveguide Display with Kepler Telescope Configuration Z. Shen, Y. Zhang, A. Liu, Y. Weng, X. Zhu, X. Li (Southeast Univ., China)
PRJ1/FMC2-4	Light Efficiency Modeling for a Holographic Waveguide Display X. Zhu, Y. Zhang, Z. Shen, A. Liu, Y. Weng (Southeast Univ., China)

FMC3-1	See-Through Aerial Secure Display with Head-Tracking Function S. Ito, K. Uchida, H. Yamamoto'* (Utsunomiya Univ., Japan, *JST ACCEL, Japan)
FMC3-2	Functional Projection Screen Using Diverted Corner Cube Retroreflector (D-CCR) T. Uchida', R. Ohtera, K. Wako, Y. Ishitaka, M. Kano, K. Käläntär ** (Nat. Inst. of Tech. Sendai College, Japan, Tohoku Univ., Japan, **Global Optical Solutions, Japan)
FMC3-3	Curved Aerial Information Display by Use of a Half-Mirror-Coated Fresnel Lens K. Shimose, M. Yasugi, T. Iwane, M. Nakajima, H. Yamamoto (Utsunomiya Univ., Japan, *Nikon, Japan)
FMC3-4	Optical Characteristics and Metrology of Flexible Light Sources (FLS) K. Käläntär', S. Maeda (CEREBA AIST, Japan, *Global Optical Solutions, Japan)

LCT4/FMC4-1	Invited The Application of Quantum Dot in TV Display Technology N. Chen, H. Ji, H. Xu, Z. Li, L. Liang (TCL Elect. Holdings, China)
LCT4/FMC4-2	Invited Cholesteric Liquid Crystals As Solution-Processable Holographic Optical Elements H. Yoshida', S. Cho, M. Ono, Y. Tsuboi, Z. Fan, M. Ozaki (Osaka Univ., Japan, *JST PRESTO, Japan)
LCT4/FMC4-3	Novel Black Photo Spacer Structure Applied in Liquid Crystal Display Technology W. Cao, M. Liu, Z. Deng, Y. Lin, C. Chiu, L.Ray (Shenzhen China Star Optoelect. Tech., China)
LCT4/FMC4-4	New Reflective Polarizer Film for Automotive e-Mirror Application H. Matsuda, K. Toyooka, M. Kugue* (3M Japan Prods., Japan, *3M Japan, Japan)
LCT4/FMC4-5L	New Architecture of QD-on-Chip Encapsulation System M. Uchida, K. Yoshida, H. Minamisawa, T. Masukawa, A. Miyanaga, A. Moriyasu, H. Nishikawa, K. Iida, M. Saeki, J. Kaneno (JNC Petrochem., Japan, *NS Materials, Japan)

FMC5-1	The Effect of Flash Lamp Annealing on the Performance of MOTFTs M. Junghaehnel, T. Preussner, J. Westphalen (Fraunhofer Inst. for Organic Elect., Germany)
FMC5-2	Novel High Resolution Photolithography Process (Resolution Enhancement Technology) H. Ikeda, T. Suzuki, Y. Toyama, T. Nonaka (Merck PM, Japan)
FMC5-3	Copper Undercut Mechanism Due to Side-Etch of Dry Process in Four-Mask Fabrication for High Resolution TFT-LCDs M. Chen, L. Guo, C.-Y. Chiou, Z.-W. Tan, S. Sun, H. Xia, F. Long, W.-G. Liu, J.-X. Li (Shenzhen China Star Optoelect. Tech., China)
FMC5-4	Mass-Production-Feasible Three-Mask Technology for HVA-LCD TV M.-X. Zhu, H.-Y. Xu, Z.-X. Jiang, T. Ou, S.-J. Chen, C.-Y. Lee, H. C. Lin (China Star Optoelect. Tech., China)

FMC6-1	Invited Design, Synthesis and Optical Properties of Chiral Polymers Emitting Efficient Circularly Polarized Light as OLED Materials T. Nakano (Hokkaido Univ., Japan)
FMC6-2	Invited Chiral Intertwined Spirals and Chiroptical Properties Dictated by Cylinder Helicity: The Most Intense Circularly Polarized Luminescence in Organic Compounds S. Sato'* (Univ. of Tokyo, Japan, *JST, Japan)
FMC6-3	Influence of Packaging Materials to Nano-Wire Grating Polarization Characteristics H. Jun (Shenzhen China Star Optoelect. Semiconductor Display Tech., China)
FMC6-4	Proposal of Novel Random Polarization Film with Birefringent Crystals for Real-Color Displays M. Udono', Y. Koike'** (Keio Univ., Japan, *Keio Photonics Res. Inst., Japan)

FLX5/FMC7-1	Thin and High-Quality ITO/Ag Alloy/ITO Structure for Display Electrodes Y. Toshimori, S. Nonaka, T. Nagase (Mitsubishi Materials, Japan)
FLX5/FMC7-2	Improvement of Mura and CD by Adjusting Black Matrix Component in G8.6 TFT-LCD Color Filter R. Wang, D. Zhang, D. Lei, X. Wang, J. Hung, J. Hsu, W. Chen, Y. Lu (Chongqing HKC Optoelect. Tech., China)
FLX5/FMC7-3	Black Photoresist Achieving Patterns with Extremely Low Reflection and Smooth Line Edge on Flexible Substrate A. Igawa, M.-A. Hsu* (eChem Solutions Japan, Japan, *Consistent Elect. Materials, Taiwan)
FLX5/FMC7-4	The Effects of Surfactants and Dielectrophoresis on the Electrical Property of Single-Wall Carbon Nanotube Films C. Wei, Z.-L. Yan (Tatung Univ., Taiwan)

FMC8-1	Thin Cycloolefin Polymer Film with Low Ultraviolet Transmittance Y. Hata, K. Inoue, N. Murata, H. Nakahori, S. Yamada (Zeon, Japan)
FMC8-2	High-Transmittance and Photopatternable High-k Insulating Film C.-Y. Tung, S.-C. Lee, T.-H. Liao, W.-S. Yu, M.-W. Shen, W.-C. Tsai (AU Optronics, Taiwan)
FMC8-3	A Study and Estimate Method about Mo and MoTi Barrier Endurance for Cu Diffusion X. Hu, L. Zhan, Y. Yin, J. Li, Y. Zhai, W. Cao, W. Huang, H. Yu,J. Zhang, S. Sun, W. Zhang (Shenzhen China Star Optoelect. Tech., China)
FMC8-4	The Research Focusing on Form Mechanism and Ameliorated Methods of Aluminum Thorn Grown on Gate Electrode Constructed Al/Mo Bi-layer J. Wang, Y. Yin, J. Li, X. Wei, L. Cai, Q. Lin, J. Liu, C. Hu, S. Sun, W. Zhang (Shenzhen China Star Optoelect. Tech., China)

FMCp2-1	Fundamental Solutions of Interlaced Microstructures for Photo-Electric Device and the Pseudo Negative Refractive Index Modeling for Display Component C.-J. Ou, J.-F. Qian, K.-Y. Chen, Z.-W. Wang, F.-R. Lin (Hsiuping Univ. of S&T, Taiwan)
FMCp2-2	Withdrawn
FMCp2-3	The Process and Reliability of Mini-LED Displays I.-H. Hsieh, C.-H. Kuo, Y.-W. Chang, H.-H. Wu, K.-Y. Lee, H.-P. Kuo, Y.-H. Chang, T.-L. Niu, C. Fuh, C.-M. Yang, M.-T. Ho, Y.-T. Lee, Y.-W. Chen (AU Optronics, Taiwan)
FMCp2-4L	Measurement of Optical Power Recovered by Planar Fluorescent Waveguides for Single-Spot Excitation I. Fujieda, M. Ohta, M. Okuyama, Y. Tsutsumi (Ritsumeikan Univ., Japan)
FMCp2-5L	Spatial Luminance Uniformity Improvement of Flexible Backlight Using Notch-Type Variable Light Distribution Film T. Shoji, Y. Shibata, T. Ishinabe, H. Fujikake (Tohoku Univ., Japan)
FMCp2-6L	Flexible Marble-Chain Letter-Strings Display System by Adjusting Intervals of Letters and All Dots H. Mori, Y. Aoki, K. Sakamoto (Konan Univ., Japan)

FMCp3-1	Exposure Test Results of Organic Insulation Films with DUV Broadband Illumination for High Resolution Panels K. Takasaki, N. Izumi, M. Hakko, M. Ando, N. Yabu, K. Nagano (Canon, Japan)
FMCp3-2	Study on One Infrequent Influencing Factor of TFT Mask M. Wang, J. Liu, F. Li, Y. Jia, X. Ding, W. Chen (Beijing BOE Display Tech., China)
FMCp3-3	Acceptor Doping of ZnO Films by NO Gas Decomposition on a Heated Ir Wire Surface in a Catalytic Reaction-Assisted CVD Y. Adachi, R. Iba, A. M. Hashim, A. Kato, K. Yasui (Nagaoka Univ. of Tech., Japan, Univ. Tech. Malaysia, Malaysia)
FMCp3-4	A Study and Improvement about Corrosion Mechanism of Mo/Cu Bilayer in Cleaning Process Y. Yin, J. Li, X. Hu, L. Cai, X. Wei, Q. Lin, J. Wang, J. Liu, C. Hu, S. Sun, W. Zhang (Shenzhen China Star Optoelect. Tech., China)
FMCp3-5	A Study and Improvement about Corrosion Mechanism of Mo/Cu Bilayer in CVD Y. Yin, J. Wang, X. Hu, J. Li, L. Cai, X. Wei, Q. Lin, J. Liu, C. Hu, S. Sun, W. Zhang (Shenzhen China Star Optoelect. Tech., China)
FMCp3-6	Four-Mask Process Architecture Using NH₃ Plasma Treatment Technology for Image Sticking Improvement in 32-in. TV Product F.-Y. Yang, A.-T. Cho, J. Hsu, Z. Liu, K.-J. Liu, W. Chen, Y. Lu (Chongqing HKC Optoelect. Tech., China)
FMCp3-7	Optimization Design of Silicone PAD for Bended Window Lamination in the OLED Display D.-H. Jang, B.-M. Park, S.-W. Lim, K.-Y. Han (Dankook Univ., Korea)
FMCp3-8L	Reduction of Residual OH Content in a Low-Temperature Si Oxide Film at Less than 200°C S. Horita (JAIST, Japan)
FMCp3-9L	Study on Wet Etching Behavior of Amorphous CuZr Thin Film in Hydrogen Peroxide Solution for Stretchable Display J.-W. Bae, M.-J. Kim, J. H. Seo (Korea Aerospace Univ., Korea)

FMCp4-1	Withdrawn
FMCp4-2	A Novel Liquid Crystal Displays Using Dye-Type In-Cell Polarizer Z.-X. Chen, L.-X. Chen, H.-H. Chen (Shenzhen China Star Optoelect. Tech., China)
FMCp4-3	Withdrawn
FMCp4-4	Reduction of Charge Trapping in High-k HfZrO₄ Gate Insulators A. R. Park, B. D. Choi (Sungkyunkwan Univ., Korea)
FMCp4-5L	Morphological and Electrochemical Properties of Nickel Oxide Prepared by Wet-Chemical Method K. H. Kim, S. Motoyama, Y. Abe, M. Kawamura, T. Kiba (Kitami Inst. of Tech., Japan)
FMCp4-6L	Improvement in Optical Performance of GH-Type Polarizer Using Polarization Converting Film S. Nonomura, Y. Iimura (Tokyo Univ. of A&T, Japan)
FMCp4-7L	Study on LCST-Type Phase Behavior in Ionic Liquid Device with Blend Polyimide Y. Izumi, K. Goda (Sanyo-onoda City Univ., Japan)
FMCp4-8L	Effect of Surface Treatment by Atmospheric-Pressure Plasma on Optical Property for Ionic Liquid Device K. Matsubara, N. Oshima, K. Goda (Sanyo-Onoda City Univ., Japan)

FMCp7-1L	Deposition of Insulator Film by Inductively Coupled Plasma CVD System with Low Impedance Antennas T. Sakai, M. Fujiwara, D. Azuma, S. Nakata, Y. Setoguchi, Y. Andoh (Nissin Elec., Japan)
FMCp7-2L	Deposition of Crystalline InGaZnO Film at Low Temperature Process by Inductively Coupled Plasma Sputtering System D. Matsuo, R. Miyanaga, T. Ikeda, S. Kisida, Y. Setoguchi, Y. Andoh, M. Fujii, Y. Uraoka* (Nissin Elec., Japan, *NAIST, Japan)
FMCp7-3L	ZnO:Ga Thin Film with Hydrogen and Nitrogen Post Annealing and Applications in Transparent RRAM L. W. Wang, C.-C Lin, S.-Y. Chu (Nat. Cheng Kung Univ., Taiwan)